PECVD system with mass flow meter

Product Description PECVD system with mass flow meter    Application of PECVD SYSTEM    PECVD systems are capable of depositing high quality SiO2, Si3N4, or DLC films on up to 3” diameter substrate sizes. To generate plasma, it uses RF shower head electrode or Hollow Cathode RF plasma source with Fractal Gas Distribution. The platen can be biased with RF or Pulsed DC and it is heated resistively or cooled with chilled water circulation. The chamber is evacuated to low10-7 torr pressure using 250 l/sec turbomolecular pump backed with 3.5 cfm mechanical pump. Standard unit comes with one inert gas, three reactive gas lines and four mass flow controllers. The planar Hollow Cathode Plasma source with its unique gas distribution system makes it possible to meet wide range of requirements such as plasma density, uniformity and separate activation of reactive species to cover the broadest possible deposition parameters     Featrues of PECVD SYSTEM   1.Stainless steel RF power and Aluminum chamber furnace 2.Vacuum 10-7torr range base pressure 3.RF shower head, Mircowave plasma sources 4.RF biased substrate houlder 5.Water cooled system 6.Heated platern up to 800 degree 7.Pneumatically controlled valves 8.PC controlled with lab view 9.Up to 4 MFC'S with vented box and gas manifolds   Technical parmaters of PECVD SYSTEM    

Plit Tube furnace	Input power: 208 – 240V AC, 1.2kW 1200°C Max. working temperature for < 60 minutes 1100°C Max for continuous heating High purity quartz tube 2"OD x 1.7"ID x  39.4" Length  30 segments programmable precision digital temperature controller 8" (200mm), single zone. 2.3" (60mm)  (+/-1°C) @ 1000°C
Plasma RF Generator	Output Power:5 -300W adjustable with ± 1% stability RF frequency: 13.56 MHz ±0.005% stability  Reflection Power: 200W max. Matching:                 Automatic RF Output Port:        50 Ω, N-type, female Noise:                      <50 dB.  Cooling:                    Air cooling.  Power :                     208-240VAC, 50/60Hz
Vacuum Flange and Fittings	Vacuum flange set is made of stainless steel 304.  Left flange assembly includes a KF-25 vacuum port,  two KF-25  quick clamp, A KF-25 right angle valve, a KF-25 vacuum bellows, a flange  Support 1/4 O.D  Hose fitting, and a needle valve. Right flange assembly includes a digital pirani gauge, 1/4 O.D  tube fitting, 1/4" Feedthrough and a needle valve.
Vacuum Pump	AC 220V 50 Hz  1/2HP  375W 2 Liter /S  or 120 liter/m  Oil trap (inlet) and exhaust filter (outlet) are installed. Max. vacuum:  10-2 torr
Warranty	12 month (exclusive wearing part)

   Pictures show of PECVD SYSTEM   Packaging & Shipping Packaging of PECVD SYSTEM     PLY WOOD BOX as below picture show. or as customer request.   Shipping and transportation As customer request. Generally, Our mode of transport are as by sea, by air or rail transport Our Services Payment   T/T, L/C, WEST UNION, PAYPAL, ESCROW AND ETC Warranty   Main product is 12 month, except wearing parts. Company Information Factory show Zhengzhou CY Scientific Instrument Co., Ltd is mainly engaged in the research and development, design, manufacturing and sales of equipment used in scientific researches. Independence and innovation is the company's tenet.     Contact information Skype ID: jennyhao8819 Whatsapp/wechat/viber:008615639272359 Tel:0086-0371-55199322 Fax:0086-0371-86036875 Website:www.cysi.wang   We are always at our service in 24 hours