niobium target used in electronic industry

Specifications 1.Material: niobium disk, target

2.Grade: RO4200.RO4210

3.Purity: 99.99% or 99.95%

Niobium sputtering targets, Niobium disc
Material: RO4200-1, RO4210-2
Size:
circular targets: Diameter 10mm up to 400mm x Thickness 2mm up to 28mm
rectangular targets: Thickness 1mm up to 20.32mm x Width up to 800mm x Length up to 3000mm
Purity: >=99.9% or 99.95%
Table 1: technology parameter    

Recrystallization	95%min
Grain size	ASTM 4 or finer
Surface finish	16Rms max. or Ra 0.4 ( RMS64 or better)
Flatness	0.1mm or 0.15% max
Tolerance	+/-0.010" on all dimensions

    Table.1 Chemical composition:

Chemistry                                                                %
Designation	Chief component		Impurities    maxmium
	Nb	Fe		Si	Ni	W	Mo	Ti	Ta	O	C	H	N
Nb1	Remainder	0.004		0.003	0.002	0.004	0.004	0.002	0.07	0.015	0.004	0.0015	0.002
Nb2	Remainder	0.02		0.02	0.005	0.02	0.02	0.005	0.15	0.03	0.01	0.0015	0.01

Special requirements to be agreed on by the supplier and buyer of negotiations