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High purity 99.95% Tantalum (Ta) Sputtering Targets   

Item Name	tantalum Target Ta target sputtering target  ta target
Purity	99.99%
Shape	according to your request
Available size	Round: dia 25~300mm,Thickness:3~10mm Rectangular: Length up to 1500mm Customization is available
Certificates	ISO9001:2008, SGS,The third test report
Technics	Hot IsostaticPressing (HIP)
Application	Widely used in coating processing industries A: Magnetic Data Storage Application B: Electronic and Semiconductor Appication. C: Decoration and Coating Appication. etc.

Quality Standard (99.99% Ta)
Element	Value(≤Ppm)	Element	Value(≤Ppm)	Element	Value(≤Ppm)
Nb	3	Ni	0.5	Ti	0. 5
O	10	Zr	1	Mn	0. 5
N	3	Cr	0. 5	Al	0. 5
C	5	W	1	H	2
Si	0. 5	Mo	1
Fe	2	Cu	0. 5

      Product Picture   We have the stocks so we would provide our clients the delivery promptly. Certifications    We offer different kinds of packaging including customizition packaging as per your demands.But safe shipping is the first thing.               our team        company information   Zhongnuo Advanced Material (Beijing) Technology Co., Ltd. is a high-tech enterprise specialized in the production of high-purity metal, evaporation coating materials, and sputtering targets. "Professional, high quality and high efficiency" is our company's operation philosophy. Depending on high-quality products, professional services and a good business reputation, our company is a designated material supplier for many enterprises and scientific research institutes.   Our Main Products: 
High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and Evaporation material. 
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5 
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR 
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X     more products