High Purity Aluminum Bar (4N, 5N, Sputtering Targets, cathode sputtering, cathodic sputtering))

Specifications Key Features:

(1) Efficient Electrical Conductivity

(2) Extremely Low Impurity and Trace Element Levels

Application Areas Electrolytic capacitor foil    Semiconductor industry     Plates for flat panel display industry   Sputtering targets  (cathode sputtering, cathodic sputtering)   Bonding wire   Thin films   Electronic storage systems (memory discs)    High purity alumina and powders   Bright finish and decorative use         Product Details: Purity ranges from 99.99 to 99.9999 per cent (4N to 6N)   We use the 3-layer electrolysis as well as the segregation (fractional crystallization) technology to refine aluminium   By combining these technologies we can produce products with the desired characteristics required by the market   Kryal (99.999 – 99.9999 per cent) is sold unalloyed in the form of pigs, sheet ingots, small ingots or shapes according to customer specifications   Raffinal (99.99 – 99.998 per cent) is also produced in different shapes – sheet ingots, billets, ingots and pigs   For more detailed information on these products, please email me and I will send you my professional answer as soon as possible.         Chemical Component for High Purity Aluminium:  

Type	Aluminum: (≥ %)	Impurity Content (≤%)	Main Impurity Content (≤ ppm)
			Cu	Si	Fe	Zn	Ti
AL99.99	99.99	0.01	50	30	30	20	20
AL99.993	99.993	0.007	30	13	15	10	10
AL99.996	99.996	0.004	15	10	10	10	10
AL99.999	99.999	0.001	2.8	2.8	2.5	1	0.9
AL99.9995	99.9995	0.0005	1.5	1.5	1.5	0.5	0.5