Magnetron sputtering coating system, PVD vacuum sputtering equipment
Magnetron Sputtering
What is magnetron sputtering technology?
Magnetron sputtering is another form of PVD coating technology.
Plasma coating
Magnetron sputtering is a plasma coating process whereby sputtering material is ejected due to bombardment of ions to the target surface. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage, a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target.
Reactive sputtering
Often an additional gas such as nitrogen or acetylene is used, which will react with the ejected material (reactive sputtering). A wide range of sputtered coatings is achievable with this PVD coating technique. Magnetron sputtering technology is very advantageous for decretive coating (e. G. Ti, Cr, Zr and Carbon Nitrides), because of its smooth nature. The same advantage makes magnetron sputtering widely used for tribological coating in automotive markets (e. G. CrN, Cr2N and various combinations with DLC coating - Diamond Like Carbon coating).
Magnetic fields
Magnetron sputtering is somewhat different from general sputtering technology. The difference is that magnetron sputtering technology uses magnetic fields to keep the plasma in front of the target, intensifying the bombardment of ions. A highly dense plasma is the result of this PVD coating technology.
Magnetron sputtering technology is characterized by:
A water-cooled target, so little radiation heat is generated
Almost any metallic target material can be sputtered without decomposition
Non-conductive materials can be sputtered by using radio frequency (RF)
Or medium frequency (MF) power
Oxide coatings can be sputtered (reactive sputtering)
Excellent layer uniformity
Very smooth sputtered coatings (no droplets)
Cathodes (of up to 2 meter long) can be put in any position, therefore high
Flexibility of sputtering equipment design
Huicheng manufactures and supplies all kinds of PVD vacuum coating machines. Now it is a market leader in the high-vacuum treatment field with customers from all around the world. Huicheng produces a complete range of machinery, offering different types of processes: High vacuum evaporation, multi-arc, DC sputtering, MF magnetron sputtering, continuous magnetron sputtering line etc.
Applied industries:
Surface vacuum coating for watch&clock, jewelries, tools, plastic, stainless steel sheet etc.
HCVAC can help you to enter the PVD coating easily by our vacuum coating machine and full range service. We will provide with most suitable technology according to your requirements.
We will make the special coating solution for each customer; Combine the full set production technics to meet your requirements, to ensure high efficiency of production.
Contact: Lillian Yang
Mobile: 0086-13825720037
Mode Dimension |
JT-1214 |
JT-1416 |
JT-1618 |
JT-1820 |
1200*1400mm |
1400*1600mm |
1600*1800mm |
1800*2000mm |
Film Type |
Semitransparent film, non-conducting film, gold, silver, red, blue, green, purple, seven color, etc. |
Power source Type |
Thermal evaporation power, ion bombard power, RF power |
Vacuum chamber structure |
Vertical double/single door, horizontal single door, pump system postposition |
Ultimate vacuum |
8.0*10 -4 Pa |
Vacuum system |
Diffusion pump +Roots pump +Mechanical pump +Holding pump |
Pump time |
Pump from atmosphere to 5.0*10 -2 ,Less than or equal to 6 minutes |
Workpiece motion mode |
Public rotation/Frequency control |
Control mode |
Manual/Automatic all-in-one mode, Touching screen+PLC |
Remark |
We can design the dimension of the vacuum chamber according to customer's demand. |