ITO sputtering target, ITO Target

Transparent & conductive ITO film deposited by Evaporator ITO sputtering target, ITO Target     Product Description   ITO sputtering target: Composition: In2O3 (wt%):SnO2 (wt%)=90:10 / 95:5 / 97:3  Purity: 99.99% (ICP—AES) Color: black Resistivity:≤1.8×10-4Ω·cm Factual size: 5~15μm Resistivity: <0.12mΩ·cm Coefficient of linear thermal expansion: 8.2×10-3K-1 Grain size: SEM test Main application: produce transparency conductive electrode by vapor deposition Relative density: above 99% ( low pressure oxygen atmosphere sintering method)
Dimension: Largest single chip size of ITO target which is used in TFT - LCD industry, large size can be spliced.     1.Supply Ability: to be produced as order 2.Good quality of goods, Competitive price 3.Fast feedback on your inquiries. 4.Trial order is acceptable before bulk ordering. 5.For longterm client, we could provide  free shipping cost or discount on price,etc.  

Item Name	ITO sputtering target, ITO Target
Purity	99.99%
Shape	Square/Round, According to your request
Available size	Round: dia 25~300mm,Thickness:3~10mm Rectangular: Length up to 1500mm Customization is available
Certificates	ISO9001:2008, SGS, The third test report
Technics	Hot Isostatic Pressing,  Powder metallurgy
Application	Widely used in coating processing industries such as optics, solar photovoltaic, IC and electronic electronics, solar cells, flat panel display industry, magnetic, architectural and automotive glass coating and so on.    a: architectural glass, car using glass, graphic display field. b:electronic and semiconductor field. c:decoration and mould field.       d:advanced Packing Application
Advantage	High Hard texture Low impurity content Better heat dissipation High Tensile strength

 
  Our Services    Advantage:  Zhongnuo Sputtering targets provide customers with outstanding high-volume production capability combined with low operating costs required for today’s advanced chips.   Zhongnuo Advanced is committed to providing customers with stable performance and high quality ITO target, according to the requirements of the users, composition of tolerance control at +/- 0.5 wt%, and dimensional tolerance control at +/-0.1mm, thickness ranges from 3 mm to 14 mm.   We have experienced in ITO material R&D, production and sales for over 10 years and perfectly know about all characteristics and possibilities of ITO materials. 
We grow with industries of LCD, TP and LED. We experienced every improvement required by the correlation between our ITO materials and clients’ products to achieve the perfect qualityso as to meet clients’requirements.       Our Custom service:   Zhongnuo offers a complete line of sputtering targets ranging from commercial grade to highest purity, zone refined Ultra-Pure grade. These materials can be fabricated to fit all commercially available systems or to specific dimensions required for you.
  Quality:       Microstructure                                                                  Performance   

Quality Standard (99.99% ITO)
Element	Value(≤ppm)	Element	Value(≤ppm)
Cu	1	Si	11
Pb	2	Ca	12
Zn	2	Mg	2
Cd	2	Al	1
Fe	3	Ni	1
Na	8	As	1
Item	Result	Item	Result
Loss rate of oxygen	<0.5%	phase structure	single In2O3 structure
Resistivity	≤0.18mΩ•cm	Expansivity	5×10-6K-1
Density	>99.5%	Flexural Strength	≥160MPa

  Electronic semiconductor, Recording media, Graphic display, Glass coating, Solar battery. Zhongnuo Cu target is widely used in coating processing industries A: Solar Photovoltaic Application. B: Electronic and Semiconductor Application. C: Decoration and Coating Application. etc. D:Magnetic Data Storage Application   Material Classification:    Zhongnuo provides Metal, Metal Oxides, Fluoride, Mixture, Other compound etc.    Company Information   Zhongnuo is a manufacture dealing with high purity metals, good quality and high purity is always our advantage.     Zhongnuo specilizes in manufacture for all kinds of pure metals, evaporation sources and sputtering targets for use in both thermal and E-beam evaporation as well as sputter deposition processes. We offer pure elements, compounds, alloys, ceramics in a variety of shapes, sizes and purities for R&D applications. In addition, our sputter target bonding and precious metals reclamation services save our customers time and money. Customers can access MSDS and Material Certification Sheets from us for all materials. We are always ensuring your standards are met by meeting our own quality demands.   High Purity Metal: Al, AG, Au, Bi, Co, Cr, Cu, Fe, Hf, Mg, Mn, Mo, Nb, Ni, Pb, Pd, In, Si, Sn, Ta, Ti, Zn, Zr, W targets and Evaporation material. 
Ceramic targets: Nb205, Ta205, ITO, SnO2, ZnO, Al2O3, AZO, GeS and TiO2, Ti2O3, Ti3O5 
Precions Metal: Au, AG, PT, Pd, Ru, Rh and IR 
Alloy targets: Ni-Cr, Ti-Al, Cr-Al, Si-Al, W-Ti, Cu-Ni, Ta-X, Mo-Nb and Co-Fe-X