silicon sputtering target CZ

Specifications silicon sputtering target

length:310mm max

width:200mm max

diameter:270mm max

thickness:2-12mm

1. Our products have perfect performance

Name	Silicon target
Type	Mono /poly
Purity	5N/6N
Density	2.33g/cm3
Conductivity type	N/P
Length	310mm max
Width	200mm max
Diameter	270mm max
Thickness	2-12mm
Tolerance	±0.1mm
Specific Resistance	0.005-0.02 Ω.cm
	1-10Ω.cm
	10 Ω.cm min
Parameter	Value
Density	2.33g/cm3
Melting Point	1420°C
Thermal Conductivity	163.3Wm-1K-1
Thermal Expansion	4.15*10-6/°C
Hardness	Knoop 1150
Specific Heat Capacity	703J Kg-1K-1
Dielectric Constant	13at 10GHZ
Young's Modulus(E)	131GPa
Shear Modulus(G)	79.9GPa
Bulk Modulus(K)	102GPa
Elastic Coefficients	C11=167 C12=65 C44=80
Poisson Ratio	0.266
Solubility	Insoluble in water
Molecular Weight	28.09
Class/Structure	Cubic diamond,Fd3m

 2.Our company has the technology of monocrystalline silicon growth    the silicon growth realistic pictures            We possess 20 CZ crystal growing furnaces . The company’s technical backstopping is provided by Semiconductor Material Research Institute,Hebei University of Technology. 3. We can do precision machining as the requirement of our customers.       We possess 150 precision machinings&Test instruments.     4.After all technologies we can make all shapes silicon blanks         These targets are normally available for immediate shipment from stock. Other sizes are available to special order. If the item shown is not exactly what you require please let us know by sending us an message .   5  We take the lead in the manufacturing of silicon sputtering targets and silicon optics,laser mirror in China.          Our products are sold throughout the country   6.We have a stable  overseas markets                 reliable quality  and competitive price we are professional in the manufacturing of silicon products we cherish the opportunity to establish long-term cooperation with you. OEM is welcome. Any question please contact us freely!